Parallel electron-beam-induced deposition using a multi-beam scanning electron microscope
نویسندگان
چکیده
منابع مشابه
Parallel electron-beam-induced deposition using a multi-beam scanning electron microscope
Lithography techniques based on electron-beam-induced processes are inherently slow compared to light lithography techniques. The authors demonstrate here that the throughput can be enhanced by a factor of 196 by using a scanning electron microscope equipped with a multibeam electron source. Using electron-beam induced deposition with MeCpPtMe3 as a precursor gas, 14 14 arrays of Pt-containing ...
متن کاملFocused electron beam induced deposition: A perspective
BACKGROUND Focused electron beam induced deposition (FEBID) is a direct-writing technique with nanometer resolution, which has received strongly increasing attention within the last decade. In FEBID a precursor previously adsorbed on a substrate surface is dissociated in the focus of an electron beam. After 20 years of continuous development FEBID has reached a stage at which this technique is ...
متن کاملIO nm electron beam lithography and sub-50 nm overlay using a modified scanning electron microscope
Gratings of 10 nm wide metal lines 30 nm apart, and quantum transistor gates with 10 nm wide gaps over 300 nm long between two metal rectangles have been repeatedly achieved on thick GaAs substrates using a modified scanning electron microscope operated at 35 keV and liftoff of Ni/Au. Furthermore, multilevel electron beam lithography with a standard deviation (30) of an overlay accuracy (30 dev...
متن کاملScanning Electron Beam Profile Monitor
A scanning beam profile monitor is described that was developed for use along the Stanford two-mile linear accelerator. The maximum beam loss due to scattering caused by this monitor can be made to be a small fraction of that which would be caused by a Cerenkov radiator or scintillating screen. (To be submitted to the Review of Scientific Instruments) * Work supported by the U. S. Atomic Energy...
متن کاملذخیره در منابع من
با ذخیره ی این منبع در منابع من، دسترسی به آن را برای استفاده های بعدی آسان تر کنید
ژورنال
عنوان ژورنال: Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena
سال: 2011
ISSN: 2166-2746,2166-2754
DOI: 10.1116/1.3656027